High-k materials for nonvolatile memory applications

  • Jan Van Houdt
  • Published 2005 in
    2005 IEEE International Reliability Physics…
The paper proposes solutions for the future scaling of tunnel and interpoly dielectrics (IPD) in flash memories based on high-k materials. The concept of engineered barriers is reviewed as well as the main reliability issues associated with the introduction of these materials in nonvolatile memory (NVM) devices. For completeness, the application of high-k… CONTINUE READING