High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films

@inproceedings{Matsui2005HighenergyIA,
  title={High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films},
  author={Hiroki Matsui and Hirotaka Toyoda and Hideo Sugai},
  year={2005}
}
In the magnetron sputtering process, moderate bombardment of particles on a substrate gives favorable effects on the deposited films, while excessive bombardment at high energies may cause film damage and surface roughness. To make these influences clear, high-energy ions and neutrals are comprehensively measured by a mass spectrometer with an energy analyzer in the case of magnetron sputtering of a Permalloy™ target (80%Ni∕20%Fe). Ni atoms sputtered from the target by a dc magnetron discharge… CONTINUE READING