Height distribution of equipotential lines in a region confined by a rough conducting boundary

@article{deCastro2014HeightDO,
  title={Height distribution of equipotential lines in a region confined by a rough conducting boundary},
  author={Caio P. de Castro and Thiago A. de Assis and Caio M. C. de Castilho and Roberto Fernandes Silva Andrade},
  journal={Journal of Physics: Condensed Matter},
  year={2014},
  volume={26}
}
This work considers the behavior of the height distributions of the equipotential lines in a region confined by two interfaces: a cathode with an irregular interface and a distant flat anode. Both boundaries, which are maintained at distinct and constant potential values, are assumed to be conductors. The morphology of the cathode interface results from the deposit of 2 × 104 monolayers that are produced using a single competitive growth model based on the rules of the Restricted Solid on Solid… 

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