Hard mold UV nanoimprint lithography process
@article{Zhong2012HardMU, title={Hard mold UV nanoimprint lithography process}, author={Yinsheng Zhong and Matthew Ming-Fai Yuen}, journal={2012 14th International Conference on Electronic Materials and Packaging (EMAP)}, year={2012}, pages={1-5} }
Low temperature and low pressure nano-pattern fabrication process is presented. Hard mold UV nanoimprint lithography, processed by SUSS MicroTec MA6, was used for sub-100nm pattern fabrication. The process details including mold fabrication are provided. A comparison between patterns on soft mold and hard mold is given. The governing parameters in hard mold NIL process are identified. UV curable resin AMONIL MMS4 was used as a UV-curable photo resist (PR) in the process, while 4inch Si wafer…
2 Citations
Optically Transparent and Highly Conductive Electrodes for Acousto-Optical Devices
- Materials ScienceMaterials
- 2021
The study was devoted to the creation of transparent electrodes based on highly conductive mesh structures. The analysis and reasonable choice of technological approaches to the production of such…
References
SHOWING 1-10 OF 12 REFERENCES
Low-Pressure Nanoimprint Lithography
- Chemistry
- 2004
A low pressure (2∼3 bar) nanoimprint lithography technique is developed that utilizes a thin fluoropolymer film (∼100 μm) mold. The flexible film mold allows imprinting of submicron pattern features…
Fully automated hot embossing processes utilizing high resolution working stamps
- Materials ScienceAdvanced Lithography
- 2010
Nanoimprint Lithography (NIL) is a high throughput replication technology for structures ranging from micrometer down to few nanometers. NIL can be divided into UV-Nanoimprint (UV-NIL) and Hot…
Nanoimprint Lithography: Methods and Material Requirements**
- Materials Science
- 2007
Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic…
Fabrication of molecular-electronic circuits by nanoimprint lithography at low temperatures and pressures
- Chemistry
- 2004
We have utilized a modified version of thermal nanoimprint lithography to fabricate a rewritable, nonvolatile, molecular memory device with a density of 6.4 Gbit/cm2. It has the advantages of a…
Press and release imprint: Control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL
- Materials Science
- 2011
Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
- PhysicsAdvanced materials
- 2005
A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography, which can be easily spin-coated using a suitable undercoating layer on a substrate.
Optical lithography
- PhysicsIEEE Transactions on Electron Devices
- 1975
This is the first in a series of papers describing a theoretical process model for positive photoresist. This model, based upon a set of measurable parameters, can be used to calculate the response…
Nanoimprint Lithography: principles, processes and materials
- Nova Science Publishers,
- 2011
Molding, Printing, and Other Techniques”, Chemical Reviews, Vol
- 105, No. 4
- 2005