Handbook of plasma immersion ion implantation and deposition [Book Review]

@article{Zhu2001HandbookOP,
  title={Handbook of plasma immersion ion implantation and deposition [Book Review]},
  author={Yi-Sheng Zhu and Wai-Kai Chen},
  journal={IEEE Circuits and Devices Magazine},
  year={2001},
  volume={17},
  pages={46-46}
}
IMMERSION ION IMPLANTATION AND DEPOSITION Edited by Andre Anders. John Wiley and Sons, 2000. Material research and development is most basic for industrial progress. Conventional ion implantation has been around for years in the semiconductor industry for doping of wafers and in material processing for surface treatment to synthesize alloys to improve the wear and corrosion resistance, such as with diamond-like carbon coatings. The implantation cross section is usually small. One of the… CONTINUE READING
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