HF‐Based Etching Processes for Improving Laser Damage Resistance of Fused Silica Optical Surfaces

  title={HF‐Based Etching Processes for Improving Laser Damage Resistance of Fused Silica Optical Surfaces},
  author={T. Suratwala and P. Miller and J. Bude and W. Steele and N. Shen and M. Monticelli and M. Feit and T. Laurence and M. Norton and C. W. Carr and L. Wong},
  journal={Journal of the American Ceramic Society},
The effect of various HF-based etching processes on the laser damage resistance of scratched fused silica surfaces has been investigated. Conventionally polished and subsequently scratched fused silica plates were treated by submerging in various HF-based etchants (HF or NH4F:HF at various ratios and concentrations) under different process conditions (e.g., agitation frequencies, etch times, rinse conditions, and environmental cleanliness). Subsequently, the laser damage resistance (at 351 or… Expand
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