Growth of Cu thin films by the successive ionic layer adsorption and reaction (SILAR) method

@inproceedings{Lindroos2004GrowthOC,
  title={Growth of Cu thin films by the successive ionic layer adsorption and reaction (SILAR) method},
  author={Seppo Lindroos and Taina M. Ruuskanen and Mikko Ritala and Markku Leskelae},
  year={2004}
}
Copper thin films were grown on reduced indium tin oxide, molybdenum and polymer substrates using successive ionic layer adsorption and reaction (SILAR) method. Copper films were grown sequentially in a controlled way using simple copper salt and basic solution of formaldehyde as precursors. The copper films were polycrystalline with no preferred orientation as characterised by X-ray diffraction. On all substrates, the growth was clearly island growth in the beginning but after the whole… CONTINUE READING