Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition

@article{Fowlkes2005GrowthAS,
  title={Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition},
  author={Jason D. Fowlkes and Steven J. Randolph and Philip D. Rack},
  journal={Journal of Vacuum Science \& Technology B},
  year={2005},
  volume={23},
  pages={2825-2832}
}
While several studies have suggested that secondary electrons dominate electron beam induced deposition (EBID), we demonstrate that primary electrons (PE’s) contribute significantly to the deposition for nanoscale EBID over the electron beam energy range (500–20keV). High-aspect ratio pillar growth is a signature of EBID; W nanopillar growth on SiO2 substrate yielded a growth rate of 6nms−1 and a nanopillar aspect ratio of ∼50. A simple integration of the primary, secondary, and backscattered… 

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