Grayscale patterning of polymer thin films with nanometer precision by direct-write multiphoton photolithography.

Abstract

The fabrication of arbitrary grayscale patterns in poly(ethylene dioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) thin films is demonstrated. Patterns are formed by ablative direct-write multiphoton lithography using a sample scanning microscope and 870-nm light from a mode-locked Ti:sapphire laser. The surface profiles of all etched samples are… (More)
DOI: 10.1021/la8008877

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