Galvanic porous silicon composites for high-velocity nanoenergetics.

Abstract

Porous silicon (PS) films ∼65-95 μm thick composed of pores with diameters less than 3 nm were fabricated using a galvanic etching approach that does not require an external power supply. A highly reactive, nanoenergetic composite was then created by impregnating the nanoscale pores with the strong oxidizer, sodium perchlorate (NaClO(4)). The combustion… (More)
DOI: 10.1021/nl104115u

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