Corpus ID: 67790125

GPU Acceleration of Real-Time Control Loops

@article{Bamakhrama2019GPUAO,
  title={GPU Acceleration of Real-Time Control Loops},
  author={Mohamed Bamakhrama and Alejandro Arrizabalaga and Frank Overman and Jean-Paul Smeets and Kornel van der Sommen and Remko van der Vossen and John Wagensveld},
  journal={ArXiv},
  year={2019},
  volume={abs/1902.08018}
}
  • Mohamed Bamakhrama, Alejandro Arrizabalaga, +4 authors John Wagensveld
  • Published in ArXiv 2019
  • Computer Science
  • Extreme Ultraviolet (EUV) photolithography is seen as the key enabler for increasing transistor density in the next decade. In EUV lithography, 13.5 nm EUV light is illuminated through a reticle, holding a pattern to be printed, onto a silicon wafer. This process is performed about 100 times per wafer, at a rate of over a hundred wafers an hour. During this process, a certain percentage of the light energy is converted into heat in the wafer. In turn, this heat causes the wafer to deform which… CONTINUE READING

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