From the Casimir Limit to Phononic Crystals: 20 Years of Phonon Transport Studies Using Silicon-on-Insulator Technology

@article{Marconnet2013FromTC,
  title={From the Casimir Limit to Phononic Crystals: 20 Years of Phonon Transport Studies Using Silicon-on-Insulator Technology},
  author={Amy M. Marconnet and Mehdi Asheghi and Kenneth E. Goodson},
  journal={Journal of Heat Transfer-transactions of The Asme},
  year={2013},
  volume={135},
  pages={061601}
}
Silicon-on-insulator (SOI) technology has sparked advances in semiconductor and MEMs manufacturing and revolutionized our ability to study phonon transport phenomena by providing single-crystal silicon layers with thickness down to a few tens of nanometers. These nearly perfect crystalline silicon layers are an ideal platform for studying ballistic phonon transport and the coupling of boundary scattering with other mechanisms, including impurities and periodic pores. Early studies showed clear… 

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