Forbidden pitches in SubWavelength Lithography and their Implications on Design

@inproceedings{Kundu2006ForbiddenPI,
  title={Forbidden pitches in SubWavelength Lithography and their Implications on Design},
  author={Sandip Kundu and Aswin Sreedhar and Alodeep Sanyal},
  year={2006}
}
Moore’s Law has been the most important benchmark for microelectronics development over the past four decades. It has been interpreted to mean that critical dimensions (CD) of a design must shrink geometrically over time. The chip-level integration of devices has been possible through concurrent improvement in lithographic resolution. The lithographic resolution was primarily improved by moving deeper into ultraviolet spectrum of light. However, the wavelength of the optical source used for… CONTINUE READING

Citations

Publications citing this paper.
Showing 1-10 of 11 extracted citations

References

Publications referenced by this paper.
Showing 1-10 of 13 references

A Little light magic,

  • F. Schellenberg
  • IEEE Spectrum,
  • 2003
2 Excerpts

Forbidden pitches for 130nm lithograph and below,

  • Robert Socha, Mircea Dusa, +4 authors Kevin Cummings
  • Optical Microlithography XIII, Christopher J…
  • 2000
2 Excerpts

Understanding the Forbidden Pitch Phenomenon and Assist Feature Placement

  • Robert Socha, Mircea Dusa, +4 authors Kevin Cummings
  • , “ Forbidden pitches for 130 nm lithograph and…
  • 2000

A Neutral Netlist of 10 Combinational Benchmark Circuits and a Target Translator in Fortran

  • F. Brglez, H. Fujiwara
  • Proc. IEEE Int. Symp. On Circuits and Systems,
  • 1985
1 Excerpt

Similar Papers

Loading similar papers…