Focused electron beam induced deposition: A perspective

  title={Focused electron beam induced deposition: A perspective},
  author={Michael Huth and Fabrizio Porrati and Christian H. Schwalb and Marcel Winhold and Roland Sachser and Maja Dukic and Jonathan D. Adams and Georg E. Fantner},
  booktitle={Beilstein journal of nanotechnology},
BACKGROUND Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is now particularly attractive for several areas in both, basic and applied research. The present topical… CONTINUE READING
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Non - Cryst

N. F. J. Mott
Solids • 1968

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