Focused Ion Beam Nanopatterning for Optoelectronic Device Fabrication

@article{Kim2005FocusedIB,
  title={Focused Ion Beam Nanopatterning for Optoelectronic Device Fabrication},
  author={Y. K. Kim and A. J. Danner and J. J. Raftery and K. D. Choquette},
  journal={IEEE Journal of Selected Topics in Quantum Electronics},
  year={2005},
  volume={11},
  pages={1292-1298}
}
Recent photonic device structures, including distributed Bragg reflectors (DBRs), one-dimensional (1-D) or two-dimensional (2-D) photonic crystals, and surface plasmon devices, often require nanoscale lithography techniques for their device fabrication. Focused ion beam (FIB) etching has been used as a nanolithographic tool for the creation of these nanostructures. We report the use of FIB etching as a lithographic tool that enables sub-100-nm resolution. The FIB patterning of nanoscale holes… CONTINUE READING
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