Fluoropolymers for 157 nm Lithography : Optical Properties from VUV Absorbance and Ellipsometry Measurements

With the introduction of 157 nm as the next optical lithography wavelength, the need for new pellicle and photoresist materials optimized for this wavelength has produced much activity in optical characterization of thin film materials. Here we focus on ultratransparent fluoropolymers for 157 nm pellicle applications where absorbances below 0.01/μm are… CONTINUE READING