Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces

  title={Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces},
  author={Atsushi Hozumi and Kazuya Ushiyama and Hiroyuki Sugimura and Osamu Takai},
Water-repellent surfaces have been prepared by exposing Si substrates with a hydroxylated surface oxide to fluoroalkyl silane (FAS) vapor. Since this chemical vapor surface modification (CVSM) is based on the chemical reaction between organosilane molecules and hydroxyl groups at the oxide surface, prior to CVSM, the substrate surface was completely hydroxylated by irradiating in air with a 172-nm ultraviolet light until the water contact angle of the surface became almost 0°. Under atmospheric… Expand
Formation and Surface Properties of Fluoroalkylsilane Monolayers by Chemical Vapor Reaction
A SUS316 substrate surface was modified with fluoroalkylsilane (FAS) by a chemical vapor reaction with the aim to form fluoride thin layers on the metal surface. The water repellency of the substrateExpand
Chemical properties of an oxide nanoskin on a polymeric surface
Abstract Vapor phase chemisorption of 1,3,5,7-tetramethylcyclotetrasiloxane onto polyimide (PI) substrates and subsequent photooxidation using 172 nm vacuum ultraviolet (VUV) light successfullyExpand
Protective layer for cycloolefin polymer against an aromatic solvent prepared by chemical vapor deposition using cyclosiloxane as a raw molecule
Abstract A chemical vapor deposition (CVD) process on the basis of a closed cell system for organosilane coating on cycloolefin polymer (COP) has been developed in order to provide the polymer withExpand
Lateral force on fluoroalkylsilane self-assembled monolayers dependent on molecular ordering
Fluoroalkylsilane (FAS) self-assembled monolayers were prepared on silicon oxide surfaces by exposing the oxide surfaces to vapor of an FAS precursor, that is, [CF3(CF2)n(CH2)2Si(OCH3)3, n=5 or 7,Expand
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A self-assembled monolayer (SAM) of fluoroalkyl silane (FAS) was deposited on a silicon surface by chemical vapor deposition (CVD) at room temperature under 1.01x10(5)Pa nitrogen to enhance the stability and biocompatibility of the base material. Expand
Recruiting physisorbed water in surface polymerization for bio-inspired materials of tunable hydrophobicity
Chemical grafting has been widely used to modify the surface properties of materials, especially surface energy for controlled wetting, because of the resilience of such coatings/modifications.Expand
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A convenient, laboratory-scale method for the vapor deposition of dense siloxane monolayers onto oxide substrates was demonstrated and an excess of water above the calculated stoichiometric amount was necessary to hydrolyze all methoxy groups and achieve dense monolayer densification. Expand
Organosilane self‐assembled monolayers formed at the vapour/solid interface
Self-assembly of organosilane molecules at the vapour/solid interface under atmospheric pressure conditions was explored in order to form a monolayer on oxide-covered silicon substrates. Three typesExpand
Alkylsilane−SiO2 hybrids : a concerted picture of temperature effects in vapor phase functionalization
The vapor-phase deposition of triethoxy(octyl)silane and 1H,1H,2H,2H-perfluoroctyltriethoxysilane on silica substrates was studied at different temperatures (70–150 °C). An original combination ofExpand
The decomposition mechanism of p-chloromethylphenyltrimethoxysiloxane self-assembled monolayers on vacuum ultraviolet irradiation
The decomposition mechanism of p-chloromethylphenyltrimethoxysiloxane (CMPS) self-assembled monolayers (SAMs) due to vacuum ultraviolet (VUV) irradiation at a wavelength of 172 nm has been studiedExpand