Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces

@article{Hozumi1999FluoroalkylsilaneMF,
  title={Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces},
  author={Atsushi Hozumi and Kazuya Ushiyama and Hiroyuki Sugimura and Osamu Takai},
  journal={Langmuir},
  year={1999},
  volume={15},
  pages={7600-7604}
}
Water-repellent surfaces have been prepared by exposing Si substrates with a hydroxylated surface oxide to fluoroalkyl silane (FAS) vapor. Since this chemical vapor surface modification (CVSM) is based on the chemical reaction between organosilane molecules and hydroxyl groups at the oxide surface, prior to CVSM, the substrate surface was completely hydroxylated by irradiating in air with a 172-nm ultraviolet light until the water contact angle of the surface became almost 0°. Under atmospheric… Expand
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