Fluorination mechanisms of Al 2 O 3 and Y 2 O 3 surfaces irradiated by high-density C F 4 / O 2 and S F 6 / O 2 plasmas

@inproceedings{Miwa2009FluorinationMO,
  title={Fluorination mechanisms of Al 2 O 3 and Y 2 O 3 surfaces irradiated by high-density C F 4 / O 2 and S F 6 / O 2 plasmas},
  author={Kazuhiro Miwa and Norihisa Takada and Koichi Sasaki},
  year={2009}
}
Fluorination of Al{sub 2}O{sub 3} and Y{sub 2}O{sub 3} surfaces was investigated by irradiating high-density, helicon-wave CF{sub 4}/O{sub 2} and SF{sub 6}/O{sub 2} plasmas. The Al{sub 2}O{sub 3} surface bombarded by high-flux positive ions of the CF{sub 4}/O{sub 2} plasma was fluorinated significantly. On contrast, Y{sub 2}O{sub 3} was less fluorinated than Al{sub 2}O{sub 3} when they were irradiated by the same CF{sub 4}/O{sub 2} plasma. The analysis of the Al{sub 2}O{sub 3} surface… CONTINUE READING