Flexible and transferrable self-assembled nanopatterning on chemically modified graphene.


Figure 1 . (a) Transferrable self-assembled nanopatterning procedure. See text for details. SEM images of lamellar BCP nanotemplates transferred onto (b) right angled fracture edge of silicon wafer and (c) microscale ZnO hillock. (d) Photograph and (e) SEM image of cylindrical BCP nanotemplates transferred onto syringe needle surface. Block copolymer (BCP) self-assembly generates dense and periodic nanodomains, whose characteristic dimensions can be as small as 3 nm. [ 1–3 ] Such self-assembly in thin fi lms can create two-dimensional lithographic nanotemplates with pattern precision barely attainable by other methods. [ 4–9 ] Substantial progress in the synergistic integration of BCP selfassembly with e-beam lithography and ArF or other photolithography, demonstrates that this self-assembly based nanopatterning is a promising technology to complement the resolution limit of a conventional lithography. [ 10–20 ] Meanwhile, BCP self-assembled nanopatterning has been regarded as an intrinsic two-dimensional patterning method specifi cally useful for hard and fl at inorganic substrates. [ 4 , 21 ] The wellestablished processing steps involved with the formation of uniform thickness, ultrathin (typically less than 100 nm) BCP fi lm via spin casting and subsequent thermal/solvent annealing are generally considered incompatible to three-dimensional geometries or conventional fl exible polymer substrates with low chemical/thermal stability and surface roughness typically larger than nanoscale. In this work, mechanically robust but compliant chemically modifi ed graphene (CMG) fi lm [ 22 , 23 ] is introduced as a transferrable and disposable substrate for the self-assembled nanopatterning of nonplanar, fl exible, and even multistack device oriented structures. Taking advantage of the high chemical/ thermal stability, genuine atomic scale fl atness, and mechanical robustness with compliance, graphene based materials can be excellent substrates for nanopatterning (Supporting Information, Table S1). [ 24 , 25 ] While pristine graphene has a low surface energy, CMG prepared via

DOI: 10.1002/adma.201204131

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@article{Kim2013FlexibleAT, title={Flexible and transferrable self-assembled nanopatterning on chemically modified graphene.}, author={Ju Young Kim and Bong Hoon Kim and Jin Ok Hwang and Seong-Jun Jeong and Dong Ok Shin and Jeong Ho Mun and Young Joo Choi and Hyeong Min Jin and Sang Ouk Kim}, journal={Advanced materials}, year={2013}, volume={25 9}, pages={1331-5} }