First results of the new endcap TOF commissioning at BESIII

  title={First results of the new endcap TOF commissioning at BESIII},
  author={Z. Wu and S. Sun and Y. K. Heng and X. Wang and Y. Sun and C. Li and Z. Liu and Hong-Liang Dai and J. Zhang and Pengcheng Cao and W. Sun and S. Wang and Yu Wang and Xiangdong Ji and J. Zhao and Wenfeng Gong and M. Chen and M. H. Ye and Y Qiu and X. Y. Ma and M. Xu and X. Luo and J. Li and R. Yang and F. F. An and Qi An and X. Jiang and Zhen Liu and S. Liu and K. J. Zhu},
  journal={Journal of Instrumentation},
  pages={C07005 - C07005}
  • Z. Wu, S. Sun, K. Zhu
  • Published 5 May 2016
  • Physics
  • Journal of Instrumentation
The upgrade of the current BESIII Endcap TOF (ETOF) is carried out with Multi-gap Resistive Plate Chamber (MRPC) technology. The installation of the new ETOF has been finished in October 2015. The first results of the MRPCs commissioning at BESIII are reported in this paper. 
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