Multiple-Field Approach for Aberration Correction in Miniature Imaging Systems Based on Wafer-Level Production
- Eric Logean∗a, Toralf Scharfa, Nicolas Bongarda, Hans Peter Herziga, Markus Rossib
Using multiple optical channels increases the number of design possibilities for the objectives of mobile imaging devices. For easy wafer-level fabrication, we start from a single optical element—a monocentric plano-convex lens. The quality of the areal image is used to select the size of the field of each channel. Each channel optics is axially positioned to reduce the effect of the image field curvature. The resulting device has a small number of channels and it images a full field of view of AE40 deg with an f-number of 3. Details of the optical design, of the fabrication process, and of the device performance are reported. 1 Introduction The camera objective is the most difficult element to integrate into nomadic devices. In addition to the significant thickness of the objective, its mounting requirements are often difficult to meet and are costly. These problems stem from the traditional approach to control the aberrations using a series of lenses placed sequentially along the optical axis.