Field and temperature acceleration of time-dependent dielectric breakdown for reoxidized-nitrided and fluorinated oxides


The effects of injection current density and temperature on time-dependent dielectric breakdown (TDDB) of low-pressure thermally reoxidized-nitrided oxides (RNOs) and fluorinated oxides (FOs) with equivalent oxide thicknesses of 100 AA were examined. Time to breakdown for RNO was found to be improved over that for thermal oxide while both the impact… (More)

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