Ferroelectric PbTiO 3 films grown by pulsed liquid injection metalorganic chemical vapour deposition

Abstract

The influence of various deposition conditions (deposition temperature, partial oxygen pressure and solution composition) to the growth of ferroelectric PbTiO3 (PTO) films by pulsed liquid injection metalorganic chemical vapour deposition (MOCVD) was examined. Films were grown on LaAlO3 (001), SrTiO3 (001) and sapphire (R-plane) substrates. Pb(thd)2 and Ti… (More)

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