Fault detection in reactive ion etching systems using one-class support vector machines

Abstract

A robust method to detect faults in reactive ion etching systems using optical emission spectroscopy data is proposed. The approach is based on one-class support vector machines (SVMs). Unlike previously proposed fault detection methods, this approach only requires data collected during normal equipment operation to be trained. The results obtained suggest… (More)

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@article{Sarmiento2005FaultDI, title={Fault detection in reactive ion etching systems using one-class support vector machines}, author={Ted Sarmiento and S. J. Hong and G. May}, journal={IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005.}, year={2005}, pages={139-142} }