Fast optical and process proximity correction algorithms for integrated circuit manufacturing

@inproceedings{Cobb1998FastOA,
  title={Fast optical and process proximity correction algorithms for integrated circuit manufacturing},
  author={Nicolas B. Cobb and Avideh Zakhor},
  year={1998}
}
Fast Optical and Process Proximity Correction Algorithms for Integrated Circuit Manufacturing by Nicolas Bailey Cobb Doctor of Philosophy in Engineering: Electrical Engineering and Computer Science University of California at Berkeley Professor Avideh Zakhor, Chair Optical Proximity Correction (OPC) is used in lithography to increase the achievable resolution and pattern transfer delity for IC manufacturing. The fundamental idea behind OPC is to modify the mask itself in order to correct for… CONTINUE READING

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