Fast Yield-Driven Fracture for Variable Shaped-Beam Mask Writing

  title={Fast Yield-Driven Fracture for Variable Shaped-Beam Mask Writing},
  author={Andrew B. Kahng and Xu Xu and Alex Zelikovsky},
Increasing transistor densities, smaller feature sizes, a nd the aggressive use of RET techniques with each successive process generation have collectively presented new challe nges for current fracture tools, which are at the heart of layout data preparation. One main challenge is to reduce the number of small dimension trapezoids ( slivers) to improve mask yield since the sliver count reflects the risk of mask critical-dimension errors. Some commercial tools are available for handling the… CONTINUE READING
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