Fabrication of wiregrid micropolarizers for imaging from visible to infrared wavelengths

@article{Watson2011FabricationOW,
  title={Fabrication of wiregrid micropolarizers for imaging from visible to infrared wavelengths},
  author={Alain Watson and Yu Wang and Zhi Jun Wu and Andrew Sarangan},
  journal={IEEE Photonic Society 24th Annual Meeting},
  year={2011},
  pages={99-100}
}
This work examines a novel approach based on a well known process in CMOS technology. A combined deep-UV interference lithography, contact printing, and Damascene metalization were used to realize wiregrid micropolarizers for use with CMOS/CCD cameras as well as infrared focal plane arrays. The Damascene process was utilized to avoid some of the difficulties in patterning high-aspect ratio metal grids.