Fabrication of single crystal silicon resonators with narrow gaps

@article{Kiihamki2005FabricationOS,
  title={Fabrication of single crystal silicon resonators with narrow gaps},
  author={Jyrki Kiiham{\"a}ki and Ville Kaajakari and Hanne Luoto and Hannu Kattelus and Marko Yli-Koski},
  journal={The 13th International Conference on Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05.},
  year={2005},
  volume={2},
  pages={1354-1357 Vol. 2}
}
This paper reports a novel method for fabrication of micromechanical resonators with very narrow gaps for electrostatic actuation. Vertical 50-180 nm wide gaps are realized using sacrificial etching of oxide sandwiched between APCVD deposited epipoly and patterned single crystal silicon structure layer of SOI wafer. 

Citations

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