Fabrication of silicon dioxide nanochannel arrays without nanolithography for manipulation of DNA molecule

@inproceedings{Cho2008FabricationOS,
  title={Fabrication of silicon dioxide nanochannel arrays without nanolithography for manipulation of DNA molecule},
  author={Younghak Cho and Seung-Woong Lee and Takao Fujii and Beomjoon Kim},
  year={2008}
}
In this paper, silicon dioxide (SiO"2) nanochannel arrays for DNA molecule stretching are presented. The fabrication of SiO"2 nanochannel is based on the combination of wet anisotropic etching, local oxidation of silicon (LOCOS) and plasma etching of silicon. This fabrication technique is suggested for generating SiO"2 layer, which is easily controllable by oxidation condition. Thus, this technique enables the generation of nanochannels with various nanoscale dimensions without using… CONTINUE READING