Fabrication of sawtooth diffraction gratings using nanoimprint lithography

@article{Chang2003FabricationOS,
  title={Fabrication of sawtooth diffraction gratings using nanoimprint lithography},
  author={Chih-Hao Chang and R. Heilmann and R. C. Fleming and J. M. Carter and E. Murphy and M. Schattenburg and T. Bailey and J. Ekerdt and R. Frankel and R. Voisin},
  journal={Journal of Vacuum Science \& Technology B},
  year={2003},
  volume={21},
  pages={2755-2759}
}
We report a process which integrates interference lithography, nanoimprint lithography, and anisotropic etching to fabricate replicated diffraction gratings with sawtooth profiles. This new process greatly reduces grating fabrication time and cost, while preserving the groove shape and smoothness. Relief gratings with 400 nm period inverted triangular profiles and 200 nm period gratings with 7° blaze angle were replicated from silicon masters with surface roughness of less than 1 nm. This… Expand

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Diffraction Gratings and Applications ͑Marcel Dekker
  • Diffraction Gratings and Applications ͑Marcel Dekker
  • 1997
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