Fabrication of quantum dots using in-situ etching and regrowth during MBE growth

@article{Liu1993FabricationOQ,
  title={Fabrication of quantum dots using in-situ etching and regrowth during MBE growth},
  author={Der-Cherng Liu and Chien-Ping Lee and S. L. Shy},
  journal={Proceedings of IEEE International Electron Devices Meeting},
  year={1993},
  pages={427-429}
}
A novel fabrication technique for semiconductor quantum dots is demonstrated. Using in-situ thermal etching during molecular beam epitaxial growth (MBE) with a built-in evaporation mask, semiconductor quantum dots were obtained in a single growth run. Photoluminescence spectra clearly indicated the blue shift as a result of the quantum confinement effect.<<ETX>> 

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