Fabrication of patternable nanopillars for microfluidic SERS devices based on gap-induced uneven etching

@article{Wang2015FabricationOP,
  title={Fabrication of patternable nanopillars for microfluidic SERS devices based on gap-induced uneven etching},
  author={Yan Wang and L. C. Tang and H. Y. Mao and Cheng Lei and Wen bin Ou and J. J. Xiong and Yi Ou and A. J. Ming and Dan Li and Dapeng Chen},
  journal={2015 28th IEEE International Conference on Micro Electro Mechanical Systems (MEMS)},
  year={2015},
  pages={320-323}
}
In this work, a lithography-free approach for fabricating patternable nanopillars is reported. The key technique of the approach is to introduce a gap over the substrate by covering it with a cap, which contains through holes and the material on its lower surface has similar etching rate with the substrate. By this means, uneven etching of the substrate is… CONTINUE READING