Fabrication of nanopillars by nanosphere lithography

@inproceedings{Cheung2009FabricationON,
  title={Fabrication of nanopillars by nanosphere lithography},
  author={Chin Li Cheung and Cathy E. Reinhardt and Tzu Fang Wang},
  year={2009}
}
A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere etch mask coated silicon substrates were etched using oxygen plasma and a timemultiplexed “Bosch… CONTINUE READING
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