Fabrication of nanocontacts for molecular devices using nanoimprint lithography

Abstract

We present a simple process to fabricate gold nanocontacts with a gap as small as sub-10 nm. This method uses a two-step process of nanoimprint lithography ~NIL! and electromigration. First, 20 nm wide gold nanowires were fabricated by NIL on a silicon dioxide substrate. Then by passing an electric current through a nanowire, the nanowire is split into two… (More)

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