Fabrication of distortion free x-ray masks using low stress tungsten

@inproceedings{Ku1991FabricationOD,
  title={Fabrication of distortion free x-ray masks using low stress tungsten},
  author={Yao-Ching Ku},
  year={1991}
}
X-ray lithography is an emerging technology for future integrated circuit fabrication for linewidth of O.5J.1.mor below. There are two main criterion of applying x-ray lithography in production: x-ray source and mask technology. At this time, x-ray mask fabrication presents the greatest challenge. The two main elements of a x-ray mask are the membrane and absorber. Ideally a good x-ray mask should consist of high mechanical strength, high optical and high x-ray transmission membrane, together… CONTINUE READING