Fabrication of Nanofluidics and Nanopore Using Reactive-ion Dry-etching with Electron-beam Baked Resists

@inproceedings{Ohshiro2012FabricationON,
  title={Fabrication of Nanofluidics and Nanopore Using Reactive-ion Dry-etching with Electron-beam Baked Resists},
  author={Takahito Ohshiro and Chie Hotehama and Kazuki Matsubara and Kazumi Konda and Hiroe Kowada and Sanae Murayama and Rie Yamada and Tomoyo Kawase and Masateru Taniguchi and Tomoji Kawai},
  year={2012}
}
We developed a simple fabrication procedure for a fabrication of nanostructures with electron-beam (EB) lithography. We found that, an electron-beam irradiation with a density of over 50 mC/cm have high-resistance against dry-etching, resulting preserve in a clear-pattern of fluidics and through-hole pore for the EB-lithographed image. This electron-beam “baking” procedure would be a useful for EB lithography fabrications of nanobiodevices containing various kinds of nanostructure, e.g., pore… CONTINUE READING