Fabrication of MEMS structure with nano-gap using photo-assisted electrochemical etching

Abstract

In this paper, MEMS comb structures with several tens of nanometer gap and ultra high aspect ratio more than 125:1 has been achieved using modified photo-assisted electro-chemical etching method. It is possible to control the gap of the comb structure from 50 nm to 1 /spl mu/m by adjusting the intensity of the light source, which is unusually blue LED… (More)

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