Fabrication of 100nm Sized Patterns on Flexible Polyethylene-Terephthalate Substrate Using Monomer Based Thermal Curing Nanoimprint Lithography

@inproceedings{Lee2007FabricationO1,
  title={Fabrication of 100nm Sized Patterns on Flexible Polyethylene-Terephthalate Substrate Using Monomer Based Thermal Curing Nanoimprint Lithography},
  author={Heon Lee and Ki Yeon Yang and Sung Hoon Hong},
  year={2007}
}
In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to… CONTINUE READING

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