Fabrication and Characteristics of Indium Tin Oxide Films on Polycarbonates CR39 Substrate for OTFTs

@article{Kwon2007FabricationAC,
  title={Fabrication and Characteristics of Indium Tin Oxide Films on Polycarbonates CR39 Substrate for OTFTs},
  author={Sung-yeol Kwon},
  journal={Korean Journal of Materials Research},
  year={2007},
  volume={17},
  pages={232-235}
}
  • Sung-yeol Kwon
  • Published 27 April 2007
  • Materials Science
  • Korean Journal of Materials Research
Abstract Indium tin oxide (ITO) films were deposited on polycarbonate CR39 substrate using DC magnetronsputtering. ITO thin films were deposited at room temperature because glass-transition temperature of CR39substrate is 130 o C ITO thin films are used as bottom and top electrodes and for organic thin film transparenttransistor (OTFT). The electrodes electrical properties of ITO thin films and their optical transparencyproperties in the visible wavelength range (300-800 nm) strongly depend on… 

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References

SHOWING 1-10 OF 14 REFERENCES
Indium tin oxide thin films for organic light-emitting devices
High-quality indium tin oxide (ITO) thin films (150–200 nm) were grown on glass substrates by pulsed laser deposition (PLD) without postdeposition annealing. The electrical, optical, and structural
Indium tin oxide thin films grown on flexible plastic substrates by pulsed-laser deposition for organic light-emitting diodes
Transparent conducting indium tin oxide (ITO) thin films were grown by pulsed laser deposition (PLD) on flexible polyethylene terephthalate (PET) substrates. The structural, electrical, and optical
Properties of ITO on PET film in dependence on the coating conditions and thermal processing
Abstract Thin films of indium tin oxide (ITO) were deposited onto plastic web (PET) by reactive DC magnetron sputtering from a ceramic target of In 2 O 3 /SnO 2 (90:10). The layer thickness and
The growth of indium-tin-oxide thin films on glass substrates using DC reactive magnetron sputtering
Abstract The growth of indium-tin-oxide thin films as a function of thickness using DC reactive magnetron sputtering was investigated. As the film thickness grew, the crystallinity increased showing
Criteria for ITO (indium tin-oxide) thin film as the bottom electrode of an organic light emitting diode
Abstract TCO (transparent conductive oxide) thin films such as ITO (indium tin oxide) have important roles in fabrication of OLED (organic light emitting diode) displays. Although ITO is the most
Amorphous ITO thin films prepared by DC sputtering for electrochromic applications
Indium-Tin-Oxide (ITO) thin films were deposited on glass substrates using DC magnetron reactive sputtering at different bias voltages and substrate temperatures. Some improvements were obtained on
Preparation and electrical properties of ITO thin films by dip-coating process
Indium tin oxide (ITO) thin films were prepared on quartz glass substrates by a dip-coating process. The starting solution was prepared by mixing indium chloride dissolved in acetylacetone and tin
ITO thin films deposited by RTE on flexible transparent substrates
Indium-tin oxide (ITO) thin films were successfully deposited onto transparent flexible substrates of hydroxypropylcellulose (HPC) cross-linked with 1,4-di-isocyanatobutane (BDI). The effect of O 2
Comparative study of ITO layers deposited by DC and RF magnetron sputtering at room temperature
Two different magnetron sputtering techniques with RF and DC plasma discharge modes were tested for room temperature deposition of ITO layers from In2O3:SnO2 targets (10 wt% SnO2). The influence of
Crystallization of indium tin oxide thin films prepared by RF-magnetron sputtering without external heating
Indium tin oxide (ITO) thin films were deposited by the RF-magnetron sputtering method and the crystallization behavior of the films with no external heating as a function of deposition time was
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