FTIR studies reveal that silicon-containing laser-induced desorption products are surface reaction intermediates

@inproceedings{Gupta1991FTIRSR,
  title={FTIR studies reveal that silicon-containing laser-induced desorption products are surface reaction intermediates},
  author={Pushpa Sree Gupta and Anne C. Dillon and Philip A. Coon and Steven M. George},
  year={1991}
}
Abstract Silicon-containing laser-induced desorption (LID) products such as SiOH and SiNH 2 have been observed from Si(111) 7 × 7 surfaces exposed to H 2 O and NH 3 . Assuming that the LID species were derived from surface reaction intermediates, these LID products were employed to examine the thermal stability of the SiOH and SiNH 2 surface species. Fourier transform infrared (FTIR) transmission spectroscopy was recently utilized to monitor the decomposition of SiOH and SiNH 2 surface species… CONTINUE READING