Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.

@article{Kunkemller2015ExtremeUP,
  title={Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.},
  author={Georg Kunkem{\"o}ller and Tobias W W Ma\ss and Ann-Katrin U. Michel and Hyun-su Kim and Sascha Brose and Serhiy Danylyuk and Thomas Taubner and Larissa Juschkin},
  journal={Optics express},
  year={2015},
  volume={23 20},
  pages={25487-95}
}
We present a method for fabrication of large arrays of nano-antennas using extreme-ultraviolet (EUV) illumination. A discharge-produced plasma source generating EUV radiation around 10.88 nm wavelength is used for the illumination of a photoresist via a mask in a proximity printing setup. The method of metallic nanoantennas fabrication utilizes a bilayer photoresist and employs a lift-off process. The impact of Fresnel-diffraction of EUV light in the mask on a shape of the nanostructures has… CONTINUE READING