Extreme Ultraviolet Resist Outgassing Quantification Verification by Resist Film Analysis

@inproceedings{Kobayashi2009ExtremeUR,
  title={Extreme Ultraviolet Resist Outgassing Quantification Verification by Resist Film Analysis},
  author={Shinji Kobayashi and Julius Joseph Santillan and Hiroaki Oizumi and Toshiro Itani},
  year={2009}
}
Numerous investigations on extreme ultraviolet (EUV) resist outgassing have been performed using the pressure rise and gas chromatography mass spectrometry (GC–MS) method. However, the reliability of the results obtained with these methods has not been clearly discussed. In this paper, to analyze and verify the reliability of the resist outgassing results, de-protection reaction and photo acid generator's (PAG's) decomposing reaction in the resist film, which are viewed as the main source of… CONTINUE READING