Experimental Study on Resonant Response of Piezoresistive Double-clamped (111)-Si Nano-beam

In this work, the resonant response of piezoresistive double-clamped silicon nano-beam has been investigated. Conventional DRIE and KOH anisotropic etching were used to fabricate the 242 nm thick nano beam from doped (111) Si substrate. High energy argon ion bombardment was then applied on selected area of the top side of the nano beam to destroy the… CONTINUE READING