Excimer lasers for superhigh NA 193-nm lithography

  title={Excimer lasers for superhigh NA 193-nm lithography},
  author={Rainer Paetzel and H. Albrecht and Peter Lokai and Wolfgang Zschocke and Thomas Schmidt and Igor Bragin and Thomas Schroeder and Christian Reusch and Stefan Spratte},
  booktitle={SPIE Advanced Lithography},
Excimer lasers are widely used as the light source for microlithography scanners. The volume shipment of scanner systems using 193nm is projected to begin in year 2003. Such tools will directly start with super high numerical aperture (NA) in order to take full advantage of the 193nm wavelength over the advanced 248nm systems. Reliable high repetition rate laser light sources enabling high illumination power and wafer throughput are one of the fundamental prerequisites. In addition these light… 
Tolerance analysis of non-depolarizing double-pass polarimetry
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High output power and ultra-narrow bandwidth has been the development goals for the 193 nm lithography excimer lasers in the last years to support the throughput and requirements of advanced 193 nm
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According to the ITRS-Roadmap, the 157nm wavelength of the F2-laser is the most likely solution to extend the optical lithography for production of ICs with critical dimensions below 70nm down to the
High-repetition-rate excimer lasers for 193-nm lithography
Capital costs and economical efficiency is becoming the most important criteria for any decision on lithography tools for an advanced IC fabrication facility. Each lithography wavelength has to
High Repetition Rate Excimer Lasers for 193nm Lithography " ; SPIE Microlithography
  • High Repetition Rate Excimer Lasers for 193nm Lithography " ; SPIE Microlithography
  • 2002