Excimer lasers for superhigh NA 193-nm lithography

R. Paetzel; H. Albrecht; P. Lokai; Wolfgang Zschocke; T. Schmidt; I. Bragin; T. Schroeder; C. Reusch; S. Spratte

DOI:10.1117/12.485344

Corpus ID: 18953813

Excimer lasers for superhigh NA 193-nm lithography

@inproceedings{Paetzel2003ExcimerLF,
  title={Excimer lasers for superhigh NA 193-nm lithography},
  author={R. Paetzel and H. Albrecht and P. Lokai and Wolfgang Zschocke and T. Schmidt and I. Bragin and T. Schroeder and C. Reusch and S. Spratte},
  booktitle={SPIE Advanced Lithography},
  year={2003}
}

R. Paetzel, H. Albrecht, +6 authors S. Spratte
Published in SPIE Advanced Lithography 2003
Engineering, Materials Science

Excimer lasers are widely used as the light source for microlithography scanners. The volume shipment of scanner systems using 193nm is projected to begin in year 2003. Such tools will directly start with super high numerical aperture (NA) in order to take full advantage of the 193nm wavelength over the advanced 248nm systems. Reliable high repetition rate laser light sources enabling high illumination power and wafer throughput are one of the fundamental prerequisites. In addition these light… Expand

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