Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories

@article{Molas2008EvaluationOH,
  title={Evaluation of HfAlO high-k materials for control dielectric applications in non-volatile memories},
  author={Gabriel Molas and Marc Bocquet and Julien Buckley and Helen Grampeix and Marc Gely and Jean Philippe Colonna and F. Martin and Pierre Brianceau and V. Vidal and Corrado Bongiorno and Salvatore Lombardo and G. Pananakakis and G{\'e}rard Ghibaudo and Barbara de Salvo and Simon Deleonibus},
  journal={Microelectronic Engineering},
  year={2008},
  volume={85},
  pages={2393-2399}
}
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