Etching process of multilayer refractory metal electrode based on reaction ion etching

@article{Xiaoguang2017EtchingPO,
  title={Etching process of multilayer refractory metal electrode based on reaction ion etching},
  author={Wang Xiaoguang and Li Xin and Zhu Xiaoming},
  journal={2017 International Applied Computational Electromagnetics Society Symposium (ACES)},
  year={2017},
  pages={1-2}
}
In this paper, the plasma etching process is applied to fabricate Ti/Pt/Au multilayer refractory metal electrode. By optimizing reasonable etching gas composition, the multi-component gas of Ar/Ar+Cl<inf>2</inf>+O<inf>2</inf>/Ar+CF<inf>4</inf>+O<inf>2</inf> is proposed to realize Ti/Pt/Au multilayer metal electrode accurately. The experiment result shows that good etching effect of multilayer refractory metal electrode is obtained by using three-step etching process.