• DOI:10.1166/JNN.2016.13602
Corpus ID: 96452764

Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam

@article{Hwan2016EtchingOM,
  title={Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam},
  author={Jeon Min Hwan and Y. K. Chae and Park Jin Woo and Yun Deok Hyun and Kim Kyong Nam and Yeom Geun Young},
  journal={Journal of Nanoscience and Nanotechnology},
  year={2016},
  volume={16},
  pages={11830}
}

Jeon Min Hwan, Y. K. Chae, +3 authors Yeom Geun Young

Published 2016

Materials Science

Journal of Nanoscience and Nanotechnology

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Min Hwan Jeon1 , Kyung Chae Yang2 , Jin Woo Park2, Deok Hyun Yun2, Kyong Nam Kim3, and Geun Young Yeom1 2 ∗ 1SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea 2Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea 3School of Advanced Materials Science and Engineering, Daejeon University, Daejeon, 330-716, South Korea