Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma

@inproceedings{Ren2008EtchingCO,
  title={Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma},
  author={Zhengmou Ren and Peter J. Heard and Janice M. Marshall and Pam A. Thomas and Siyuan Yu},
  year={2008}
}
The etching characteristics of congruent LiNbO3 single crystals including doped LiNbO3 and proton-changed LiNbO3 have been studied in reactive ion etching (RIE) and inductively coupled plasma (ICP) etching tools, using different recipes of gas mixtures. The effects of parameters including working pressure, RIE power, and ICP power are investigated and analyzed by measurement of etching depth, selectivity, uniformity, etched surface state, and sidewall profile by means of focused ion beam… CONTINUE READING

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