Enhanced self-organized dewetting of ultrathin polymer films under water-organic solutions: fabrication of sub-micrometer spherical lens arrays.

Abstract

Dewetting of ultrathin ( < 100 nm) polymer fi lms and their selforganization on physicochemically patterned substrates has been extensively studied with a view to potential applications in soft-patterning. [ 1 ] However, despite their scientifi c and technological promise, there are two major limitations for self-assembled patterns: (1) The length scale of the spinodal instability and thus the size of the resulting features are severely limited by the surface tension, γ effects, on small scales. The wavelength of the long-wave instability is given by: [ 2 ] λ = [ − 8 π 2 γ /(∂ φ /∂ h )] 1/2 , where h is the fi lm thickness and φ is the destabilizing potential ( ∼ h − 3 for van der Waals attraction). For example, dewetting of fi lms in the range of 20 nm to 100 nm produce feature sizes in the range of 5 μ m to 100 μ m [ 1 , 2 ] ; (2) The micro-structures produced by the long-wave instability have very small aspect-ratios and small contact angles in air. [ 1 , 2 ]

DOI: 10.1002/adma.201002768

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Cite this paper

@article{Verma2010EnhancedSD, title={Enhanced self-organized dewetting of ultrathin polymer films under water-organic solutions: fabrication of sub-micrometer spherical lens arrays.}, author={Ankur Verma and Ashutosh Sharma}, journal={Advanced materials}, year={2010}, volume={22 46}, pages={5306-9} }