Enhanced positioning precision and in situ macroscopic contacts for shadow-evaporated nanostructures

  title={Enhanced positioning precision and in situ macroscopic contacts for shadow-evaporated nanostructures},
  author={Dominik St{\"o}ffler and Regina Hoffmann-Vogel},
  journal={Journal of Vacuum Science \& Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena},
  • D. Stöffler, R. Hoffmann-Vogel
  • Published 2015
  • Physics
  • Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
The authors present the design of a modular sample holder that offers the possibility of in situ fabrication of metallic nanostructures under ultrahigh vacuum. One of the crucial points is to bridge the gap between the macroscopic leads and the nanostructure itself. This problem is solved by using a set of two different masks. For a precise alignment of the two masks, a magnetic tripod connection system has been developed. With this new system, an alignment precision of 26 μm is obtained. As a… 
3 Citations

Figures from this paper

Mask aligner for ultrahigh vacuum with capacitive distance control
We present a mask aligner driven by three piezo motors which guides and aligns a SiN shadow mask under capacitive control towards a sample surface. The three capacitors for read out are located at
Electromigration and the structure of metallic nanocontacts
This article reviews efforts to structurally characterize metallic nanocontacts. While the electronic characterization of such junctions is relatively straight forward, usually it is technically
Sensors based on graphene nanoribbons and polyaniline nanochannels with graphene-graphene oxide contacts formed by ion etching
One of the ways to create highly sensitive gas sensors based on graphene is to modify graphene by forming nanometer-sized channels in it. In this work, ion beam etching was used for these purposes.


Parallel nanodevice fabrication using a combination of shadow mask and scanning probe methods
We describe a resistless proximal probe-based lithography technique, which enables the direct patterning of complex and submicron-sized structures of various materials. The method is based on a
Integration of Individual Nanoscale Structures into Devices Using Dynamic Nanostenciling
We succeeded in integrating individual, pre-existing nanostructures into functional devices using ultrahigh vacuum dynamic nanostenciling and show working devices based on single-walled carbon
Fully ultrahigh-vacuum-compatible fabrication of submicrometer-spaced electrical contacts
We present an approach by which submicrometer-spaced electrical contacts can be fabricated on virtually any surface under ultrahigh-vacuum conditions. The metallic contacts are formed by subsequent
Contacting self-ordered molecular wires by nanostencil lithography
The authors grew self-ordered meso-(4-cyanophenyl)-substituted Zn(II) porphyrin molecular wires on thin epitaxial NaCl(001) layers on top of the GaAs substrates under ultrahigh vacuum (UHV)
Adjustable nanofabricated atomic size contacts
Metallic point contacts and tunnel junctions with a small and adjustable number of conduction channels have been obtained in the last few years using scanning tunneling microscope and break junction
Controlled fabrication of nanogaps in ambient environment for molecular electronics
We have developed a controlled and highly reproducible method of making nanometer-spaced electrodes using electromigration in ambient lab conditions. This advance will make feasible single molecule
All-in-one static and dynamic nanostencil atomic force microscopy/scanning tunneling microscopy system
The nanostencil is a tool for resistless lithography. It allows the direct patterning of complex nanometer-sized structures composed of a wide range of materials in an ultrahigh vacuum environment.
Scanning probe microscopy imaging of metallic nanocontacts
We show scanning probe microscopy measurements of metallic nanocontacts between controlled electromigration cycles. The nanowires used for the thinning process are fabricated by shadow evaporation.